There are a number of methods that can be used to isolate or create mono-layers of graphene, but the most simple and cost effective manner is through a process called Chemical Vapor Deposition, or CVD. CVD is currently the best method for producing high quality graphene on a large scale. Although some of the equipment required is quite specialized, the process itself is quite straight forward, so long as tight controls on time, temperature, pressure and volumes are adhered to.
Essentially, CVD is a method of depositing a substance in a gaseous state onto a metal substrate. The major benefits to this method of depositing materials, in this case graphene, onto a substrate is that the quality of the graphene produced is very high and the production costs are very low. However, the success of the process is dependent on strict coordination, requiring stringent controls being in place at every step in the process ensuring that all the reactions are effective and that the graphene that is produced is of the highest quality possible.
Although CVD is an established technology for the production of many substances, particularly in the semiconductor industry, Park Particle Research’s research scientists have developed more complex guidelines and techniques specifically for the production of graphene resulting in the highest possible quality and efficiency.